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3rd place in “Best Poster” Competition, SPIE Photomask Technology + EUV Lithography 2019
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3rd place in “Best Poster” Competition, SPIE Photomask Technology + EUV Lithography 2019
A joint poster by nano analytik GmbH and Ilmenau University of Technology was awarded third place in the “Best Poster” competition at SPIE Photomask Technology + EUV Lithography 2019, Monterey, CA, USA.
Congratulations to all contributors!
Visit https://spie.org/Documents/Membership/BacusNewsletters/BACUS-Newsletter-July-2020.pdf