2019: Scientists talk about Tip-Based Electron Beam Induced Deposition (TP-EBID) in AIP/AVS Interview

Electron-beam induced deposition (EBID) with the help of a cantilever tip (TP-EBID) is a promising new technology, having the potential to increase the spatial resolution of the deposition process while allowing for easy switching between deposition and metrology.

Recently, the AVS did an interview with leading researchers studying TP-EBID based on nano analytik GmbH’s active cantilever technology. The transcript can be found here.

For further reading, there has been an elaborate article on that specific topic in the Journal of Vacuum Science & Technology (JVST), available here.