SPIE Novel Patterning Conference

We are pleased to highlight the remarkable invited presentation, “Scanning probe lithography-based mix-and-match technique as an enabling tool for the pilot production of nanowire-based next-generation electromechanical sensors”, by Prof. Erdem Alaca (Director, n2STAR – Koç University Nanofabrication and Nanocharacterization Center for Scientific and Technological Advanced Research) at the SPIE Novel Patterning Conference 2026 in San Jose. His research provides strong impulses for advancing nanoelectromechanical systems (NEMS) through the co-fabrication of silicon nanowires as ultra-small, highly sensitive piezoresistive transducers, employing sub-10 nm Field-Emission Scanning Probe Lithography (FE-SPL) from nano analytik GmbH.

Prof. Alaca’s approach blends MEMS-like microscale interfaces with nanoscale piezoresistors, enabling scalable 3D architectures via semiconductor manufacturing. He leverages Mix-and-Match lithography and FE-SPL for high-resolution, low-proximity-patterning under ambient conditions, with real-time AFM-assisted alignment and inspection. This enables pilot production and rapid design evaluation, bridging micro- and nanoscale domains for next-generation sensors in wearables, IoT, and autonomous systems.

Congratulations on this well-deserved achievement ! 👏