The AFM-MPS is a Multi-Platform System capable of combining AFM, AES, iXPS, one source for depth profiling, load-lock for transferring samples from/to the glove box under a protective atmosphere, and a second chamber (e.g. for magnetron coating or thermal evaporation). The primary, analytical chamber with AFM is mounted on the rigid frame put on the Gimbal Piston vibration isolation. If the vibrations in the lab are too high for passive vibration isolation, it is possible to mount the frame of the analytical chamber on an active vibration isolation floor platform or on active vibration isolation piezoelectric actuators, too. The second chamber can be mounted on a separate rigid frame. Both chambers can be connected by means of special flexible bellows that compensate for forces caused by pressure differences. The sample transfer rod can be mounted to the secondary chamber in order to minimize the vibrational influence on the primary chamber. The sample size can be up to 2″. This modular chamber architecture enables advanced correlative nanoscale fabrication and surface analysis workflows within a single flexible system.
- Large sample capability – sample diameter up to 2″.
- The tool helps in the future development of the electronic devices based on single- or few dopant-QDs .
- In conventional EBID in the Scanning Electron Microscope (SEM), the primary electron beam (typically >500V) interacts with the substrate and generates backscattered electrons and low energy secondary electrons, which in combination determine the resolution.
- Based on a “top down” Field-Emission Scanning Probe Lithography (FE-SPL) approach, the realization of control gates and readout SET structures becomes a realistic goal.
- Our FE-SPL is used for fabrication of Single electron transistors (SETS), which make possible the control of quantum transport through a zero-dimensional island, source and drain, and gate electrodes.
- Fast switching between electron-field emission from the tip and non-contact AFM imaging greatly facilitates analysis of the deposits. A further important advantage is that the placement of the deposits is determined with very high positioning accuracy using the AFM navigation and fabrication of the EBID features.
| XYZ Scanning Stage | Non magnetic, closed loop |
| Range | 60µm x 60µm x 20µm |
| Resonant frequencies | X,Y=750Hz; Z=2000Hz |
| XYZ Positioner Range | X,Y,Z=15mm |
| Accuracy | 3 nm |
| Position noise | X,Y=0.4nm; Z=0.2nm |
Standard measurement techniques:
- Real Non-Contact AFM
- Contact AFM
- Phase Imaging AFM
- Intermittent Non-Contact AFM
- Conductive AFM
- I-V Spectroscopy
- Kelvin Probe Force Microscopy (KPFM)
- Scanning Capacitance Microscopy (SCM)
- Scanning Spreading Resistance Microscopy (SSRM)
| Resolution at 1000 eV dE | < 1 eV (FWHM) |
| Resolution XPS (300W Mg, Ag 3d 5/2) | < 0.89 eV (FWHM) |
| Energy range | 0 eV to 2500 eV |
| Acceptance angle | 6% of 2Π |
| Detection | Channeltron type electron multiplier |
| Integrated electron source model | Model EK-5IK |
| Beam energy | 20 eV to 5 keV |
| Minimum Spot size at 5 keV | < 100 μm |
| Beam current max. | 20 μA |
| Source control | NEK-050 |
Data acquisition
- WinspectroS multitasking package (Windows 7, 8, 10)
- VAMAS conform data files
- AUGER, ELS, XPS supported
- Optional: SEM, SAM, UPS, ISS, SEM/SAM
| Energy range | 500 eV to 5 keV |
| Minimum beam diameter | 50 μm |
| Working pressure (chamber) | 6 x 10-8 – 1 x 10-5 mbar |
| Working pressure (ion gun) | 1 x 10-4 – 1 x 10-3 mbar |
| Working distance | 10 – 125 mm |
| Filament | cold cathode |
| Gases | Argon, Xenon, O2, H2 |
| Bakeout temperature | 200° C |
| Features | Differential pumping, Emission current control |
| Power | 300W |
| Anode | Al / Mg |
| Window | Al |
| Water cooling | Approx. 3.5 l/minute |
| Security | interlock High voltage and water cooling |
| Differential pumping | Optional (pumps not included) |
| Cooling circuit | Suggested: water cooler and flow switch |
| Z Translator | 100 mm |
| HV Unit | 120V or 240V 50/60H |
| Emission control | 100V-240V 50/60Hz |
