Measurement Science and Technology 2025
Application of active piezoresistive cantilevers in high-eigenmode surface imaging
Bartosz Pruchnik, Dominik Badura, Władysław Kopczyński, Dariusz Czułek, Ivo W Rangelow, Virpi Korpelainen, Andrzej Sierakowski, Andrew Yacoot and Teodor Gotszalk
Measurement Science and Technology 2025
Characterization of a hybrid nanowire-MEMS force sensor using direct actuation.
Bartosz Pruchnik, Krzysztof Kwoka, Tomasz Piasecki, Masoud Jedari Ghourichaei, Umut Kerimzade, Onur Aydin, Bekir Aksoy, Cemal Aydogan, Gokhan Nadar, Ivo W Rangelow, Arda Deniz Yalcinkaya, Halil Bayraktar, Burhanettin Erdem Alaca and Teodor Gotszalk
SPIE Proceedings, Advanced Lithography 2025 2025
Ultra-fast correlative chemical-mechanical-polishing (CMP) metrology: Integrating Phase Shifting Interferometry with ActiveProbe Scanning Probe Microscopy
Joonho You, Chang-Soo Kim, Ki-Nam Joo, Aditya Suryadi Tan, Fabian Dietrich, Hans-Georg Pietscher, Mirosław Woszczyna, Jaqueline Stauffenberg, Thomas Fröhlich, Eberhard Manske, Thomas Kissinger, and Ivo W. Rangelow
Springer 2024
Active Probe Atomic Force Microscopy: A Practical Guide on Precision Instrumentation
Fangzhou Xia, Ivo W. Rangelow, Kamal Youcef-Toumi
Micro and Nano Engineering 2023
Tip-based nanofabrication below 40 nm combined with a nanopositioning machine with a movement range of Ø100 mm
Jaqueline Stauffenberg, Michael Reibe, Anja Krötschl, Christoph Reuter, Ingo Ortlepp, Denis Dontsov, Steffen Hess , Ivo W. Rangelow, Steffen Strehle, Eberhard Manske
Applied Physics Letters 2022
Mask-less nano-structuring of hydrogen terminated diamond using localized field emission scanning probe lithography (FESPL)
Steve A. Yiann, Martin Hofmann; Alex K. Schenk , Christoph Reuter, Ivo W. Rangelow , Christopher I. Pakes
Nano letters 2021
Advanced Scanning Probe Nanolithography Using GaN Nanowires
Mahmoud Behzadirad, Stephan Mecholdt, John N. Randall, Joshua B. Ballard, James Owen, Ashwin K. Rishinaramangalam, Alexander Reum,Teodor Gotszalk, Daniel F. Feezell, Ivo W. Rangelow, Tito Busani
Journal of Vacuum Science & Technology 2020
Field emission scanning probe lithography with GaN nanowires on active cantilevers
Mahmoud Behzadirad,Ashwin K. Rishinaramangalam,Daniel Feezell,Tito Busani,Christoph Reuter,Alexander Reum,Mathias Holz,Teodor Gotszalk,Stephan Mecholdt,Martin Hofmann,Ahmad Ahmad,Tzvetan Ivanov and Ivo W. Rangelow
Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision
I. Ortlepp, M. Kühnel, M. Hofmann, L. Weidenfeller, J. Kirchner, S. Supreeti, R. Mastylo, M. Holz, T. Michels, R. Füßl, I. W. Rangelow, T. Fröhlich, D. Dontsov; C. Schäffel; E. Manske
Journal of Sensors and Sensor Systems 2020
Determination of the mixing ratio of a flowing gas mixture with self-actuated microcantilevers
Jaqueline Stauffenberg, Steve Durstewitz, Martin Hofmann, Tzvetan Ivanov, Mathias Holz, Waleed Ehrhardt, Wolf-Ulrich Riegel, Jens-Peter Zöllner, Eberhard Manske, and Ivo W. Rangelow
Journal of Vacuum Science & Technology 2020
Line Edge Roughness Metrology Software
Sertac Guneri, Yazgi, Tzvetan Ivanov, Mathias Holz, Ivo W. Rangelow, B. Erdem Alaca
Nanotechnology, Volume 31, Number 43 2020
Silk as a biodegradable resist for field-emission scanning probe lithography
Mahmut Bicer, B. Ganesh Kumar, Rustamzhon Melikov, I. Bakis Dogru, Sadra Sadeghi, Ivo W. Rangelow, B. Erdem Alaca and Sedat Nizamoglu
International Journal of Extreme Manufacturing 2020
Scanning probe lithography on calixarene towards single-digit nanometer fabrication
Marcus Kaestner and Ivo W. Rangelow
Journal of Vacuum Science & Technology 2019
Tip-based electron beam induced deposition using active cantilevers
Mathias Holz, Frances I. Allen, Christoph Reuter, Ahmad Ahmad, Martin Hofmann, Alexander Reum, Tzvetan Ivanov, and Ivo W. Rangelow
Microscopy Today, Volume 27, Issue 6 2019
Correlative Microscopy and Nanofabrication with AFM Integrated with SEM
Mathias Holz, Frances I. Allen, Christoph Reuter, Ahmad Ahmad, Martin Hofmann, Alexander Reum, Tzvetan Ivanov, and Ivo W. Rangelow
Journal of Vacuum Science & Technology 2019
Nanoscale lift-off process using field emission scanning probe lithography
Martin Hofmann, Stephan Mecholdt, Markus Mohr, Mathias Holz, Stefano Dallorto, Eberhard Manske, Hans-Jörg, Fecht, and Ivo W. Rangelow
Journal of Vacuum Science and Technology 2019
High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology.
C. Lenk, Y. Krivoshapkina, M. Hofmann, S. Lenk, T. Ivanov, I.W. Rangelow, A. Ahmad, A. Reum, M. Holz, T. Glinsner, M. Eibelhuber, D. Treiblmayr, B. Schamberger, M. Chouiki, B.T. Chan, Z. el Otell and J.-F. de Marneffe